Date:
2020.11.06 (Fri)
Time:
10:10~11:30
Venue:
1st meeting room, 1F Oral Medicine Building, Main campus.
Topic:
Next-Generation Brain-Machine Interfaces: Materials Design and Fabrication of Ultra compliant Neural Implants
下世代腦機界面：超生物順應電子
※ Please fill out the form if you want to attend it.
Speaker:
Wei-Chen Huang
Assistant Professor | Department of Electrical and Computer Engineering, NTHU
Abstract:
Design and fabrication of multifunctional biointerfaces is beneficial for the development
of next-generation brain-machine interfaces. Precise controlling over the chemical and
physical cues of biomaterials can create bioactive interfaces to permit the efficient promotion
on the cell adhesion, growth and the extensive tissues regeneration, while it also enables the
formation of biopassive interfaces for the protection on the implantable bioelectronic device
from getting inevitable tissue responses. Strategies covering the incorporating novel
biomimetic materials, nonconventional microelectronic fabrication techniques, and
comprehensive electronic device integration strategies that are used to develop ultracompliant
neural implantable microelectrode arrays applied in central and peripheral nervous
systems (CNS and PNS). We believe that next-generation bioelectronic interfaces will
provide seamlessly match with soft tissues to exhibit unprecedented functionality and
reliability.
※Beverages will be prepared.
※ Participants can apply for the number of hours on the CBME Passport for this speech.
Please bring the CBME Passport to this speech and it will be stamped after the speech (on-site).
📎 Enclosed are the speaker’s CV and poster.